Plasma Processing for Semiconductor Materials and Thin-Film Devices - Vacuum and Thin-Film Deposition Technologies -  - 書籍 - Elsevier - Health Sciences Division - 9780443277412 - 2026年12月1日
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Plasma Processing for Semiconductor Materials and Thin-Film Devices - Vacuum and Thin-Film Deposition Technologies

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¥ 50.042
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発送予定日 2026年12月9日 - 2026年12月14日
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Plasma Processing for Semiconductor Materials and Thin-Film Devices covers the state-of-the-art in plasma processing of thin films. The book focuses on fundamental plasma theory, plasma for advanced applications, advanced characterization techniques, plasma and performance in semiconductor devices, and plasma processing. Sections consider the fundamental physics of plasma then move to advanced applications in the processing of semiconductor materials and their relation to the performance of semiconductor thin film devices.

Subsequently, the book investigates the adoption of plasma for advanced (including thin film) characterization methods, finally addressing emerging plasma technologies such as liquid plasma, cold atmospheric plasma, and advanced plasma techniques. This book will be of interest to students, researchers, and practitioners in any field that utilizes plasma processing, since its chapters have been written by leading authorities from both academia and industry.

メディア 書籍     Paperback Book   (ソフトカバーで背表紙を接着した本)
発売予定 2026年12月1日
ISBN13 9780443277412
出版社 Elsevier - Health Sciences Division
ページ数 900
寸法 150 × 220 × 10 mm   ·   450 g
編集者 Akhavan, Behnam (Associate Professor, School of Biomedical Engineering, University of Newcastle, Australia)
編集者 Chen, Sheng-Chi (Professor, Department of Materials Engineering and Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, Taiwan)
編集者 Cheong, Kuan Yew (Professor, School of Materials and Mineral Resources Engineering, Universiti Sains Malaysia)
編集者 Hsiao, Shih-Nan (Professor, Center for Low-temperature Plasma Sciences, Nagoya University, Japan)
編集者 Le, Phuoc Huu (Associate Professor, Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, Taiwan)

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