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Handbook of Advanced Semiconductor Technology and Computer Systems - Van Nostrand Reinhold Electrical / Computer Science and Engineering Series Guy Rabbat Softcover reprint of the original 1st ed. 1988 edition
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Handbook of Advanced Semiconductor Technology and Computer Systems - Van Nostrand Reinhold Electrical / Computer Science and Engineering Series
Guy Rabbat
Plasma enhanced chemical vapor deposition (PECVD) is a technique widely accepted in microelectronics for the deposition of amorphous dielectric films such as silicon nitride and silicon oxide. Batch etching reactors and etching processes are approaching ma turity after more than ten years of development.
942 pages, 202 black & white illustrations
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