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Optical and EUV Lithography: A Modeling Perspective - Press Monographs Andreas Erdmann
Optical and EUV Lithography: A Modeling Perspective - Press Monographs
Andreas Erdmann
Introduces interested students with backgrounds in physics, optics, computational engineering, mathematics, chemistry, material science, nanotechnology, and other areas to the fascinating field of lithographic techniques for nanofabrication. It should also help senior engineers and managers expand their knowledge of alternative methods and applications.
374 pages
| メディア | 書籍 Paperback Book (ソフトカバーで背表紙を接着した本) |
| リリース済み | 2021年4月30日 |
| ISBN13 | 9781510639010 |
| 出版社 | SPIE Press |
| ページ数 | 374 |
| 寸法 | 255 × 178 × 24 mm · 682 g |