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EUV Sources for Lithography - Press Monographs Vivek Bakshi
EUV Sources for Lithography - Press Monographs
Vivek Bakshi
An authoritative reference book on EUV source technology. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation.
1094 pages
| メディア | 書籍 Paperback Book (ソフトカバーで背表紙を接着した本) |
| リリース済み | 2006年2月28日 |
| ISBN13 | 9780819496256 |
| 出版社 | SPIE Press |
| ページ数 | 1094 |
| 寸法 | 150 × 220 × 10 mm · 1,63 kg (重量(概算)) |