この商品を友人に教える:
Plasma Processing for Semiconductor Materials and Thin-Film Devices
Plasma Processing for Semiconductor Materials and Thin-Film Devices
Plasma Processing for Semiconductor Materials and Thin-Film Devices covers the state-of-the-art in plasma processing of thin films. The book focuses on fundamental plasma theory, plasma for advanced applications, advanced characterization techniques, plasma and performance in semiconductor devices, and plasma processing. Sections consider the fundamental physics of plasma then move to advanced applications in the processing of semiconductor materials and their relation to the performance of semiconductor thin film devices.
Subsequently, the book investigates the adoption of plasma for advanced (including thin film) characterization methods, finally addressing emerging plasma technologies such as liquid plasma, cold atmospheric plasma, and advanced plasma techniques. This book will be of interest to students, researchers, and practitioners in any field that utilizes plasma processing, since its chapters have been written by leading authorities from both academia and industry.
| メディア | 書籍 Paperback Book (ソフトカバーで背表紙を接着した本) |
| 発売予定 | 2026年12月1日 |
| ISBN13 | 9780443277412 |
| 出版社 | Elsevier - Health Sciences Division |
| ページ数 | 900 |
| 寸法 | 150 × 220 × 10 mm · 450 g |
